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Photomask video

Photomask

Reticles are clear glass discs that fit inside the actual picture plane of a microscope's eyepiece and are marked with scales or other marks. We sometimes call it reticle or photomask,it is the same here in our company.Here is the difference between them in the market

Description

Custom Reticle Circle Targets and Mask

Reticles are clear glass discs that fit inside the actual picture plane of a microscope's eyepiece and are marked with scales or other marks. We sometimes call it reticle or photomask,it is the same here in our company.Here is the difference between them in the market:

Mask: A glass plate coated in a variety of photolithographic designs. The patterns on a mask are the same size as the final design on the wafer.

Reticle: A step-and-repeat reproduction of the pattern that will be imprinted on the wafer (or mask). The final size of the pattern on the wafer is typically many times larger than the actual size of the pattern on the reticle.

Reticle and mask distinction: A reticle differs from a mask only in terms of pattern size.

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Transparent and Reflective

Soda Lime Glass (Float Glass)

Calibration targets with laser photolithography process, standard accuracy 1μm

The highest precision can be 0.1um, and the minimum line width is 1um;

CD accuracy 0.1um\0.25um\0.3um\0.5um\1um

The maximum size can be 1000mm*1000mm;

Thickness 0.5mm\0.7mm\1mm\1.6mm\2.3mm

\3mm\4.8mm\7.8mm for options

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Quartz Glass (Fused Silica)

Calibration targets with laser photolithography process, standard accuracy 1μm

The highest precision can be 0.1um, and the minimum line width is 1um;

CD accuracy 0.1um\0.25um\0.3um\0.5um\1um

The maximum size can be 1000mm*1000mm;

Thickness 1.6-8mm for options

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Products details:

1. Photomask

The term "photomask" refers to a graphic transfer master board that creates intricate geometric patterns on glass substrates (Blanks) that include chromium and other metal films. Other names for the photomask include "mask," "photolithographic mask," "mask," and "mask," among others. In the photolithography process, the photoresist mask layer is duplicated using a "printing negative."

The photomask is made up of a film and a base (Blank) (Pellicle). The base's architecture (Blank) can be broken down into subglass; Chromium metal file; nitrocellulose makes up the pellicle membrane; adhesive tape makes up the frame.

Photomasks are commonly employed. In fields involving photolithography, including IC (Integrated Circuit), FPD (Flat Panel Display), PCB (Printed Circuit Boards), MEMS (Micro Electro Mechanical Systems), and others, masks are required.


2. Classification of photomasks

According to their intended purposes, photomasks can be divided into four categories: chrome, dry, liquid relief, and film.And they have their own advantages and disadvantages:

A Chrome

Although it is durable and has excellent precision, the cost is still somewhat costly.

B Dry Plate

moderate durability, accuracy, and cost.

C Film

To transport PI liquid, for example, is its primary purpose.

D Liquid relief plate

Low cost, low precision, and low durability.


How to customize a star target:

Custom Service

Digitalize Drawing

Our engineers would help you digitize the drawing for free.

Third Party Certification

Provide third-party certification reports.

Mounting Frames

Provide matching mechanical protection metal mounting frame.

Test Report by Visions Plus

Available

Customization Quantity

Customization MOQ is 1 pcs.

Customization Production Days

7-15 Working Days


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Package and Shipment:

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